Effect of patterns'surface roughness on organic molecular area selective growth
Area selective growth (ASG),self-assembling of molecules on pre-patterned surface,has shown a high potential for micro/nano organic patterns.In order to investigate the specific role of surface roughness of patterns in the ASG,the disorder strength parameters are introduced in the coarse-grained anisotropic interaction Kinetic Monte Carlo (KMC)model,to simulate the depositing behavior of organic molecules on the patterns with different surface roughness.Results revealed that the roughness of the patterns'surface has the effect on the deposit morphology of organic molecules:the smoother surface of the patterns,the thicker films grow on the top of the patterns;on the contrary,when the patterns'surface became rougher,particles were more likely to grow within the intervals of the patterns in a step-edge induced mode,they agree well with experimental results.These indicate that roughness could be employed for the controlling of the nucleation allocation of organic patterns for different various applications,such as full-color displays and micro-lens arrays.
area-selective growthKinetic Monte Carloorganic molecules
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