真空2015,Issue(3) :63-66.DOI:10.13385/j.cnki.vacuum.2015.03.15

低温氢等离子体还原氧化石墨烯

Reduction of graphene oxide using low temperature hydrogen plasma

梁海锋 蔡沛峰 蔡长龙
真空2015,Issue(3) :63-66.DOI:10.13385/j.cnki.vacuum.2015.03.15

低温氢等离子体还原氧化石墨烯

Reduction of graphene oxide using low temperature hydrogen plasma

梁海锋 1蔡沛峰 1蔡长龙1
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作者信息

  • 1. 西安工业大学,陕西 西安 710032
  • 折叠

摘要

还原氧化石墨烯是一种宏量制备石墨烯的有效方法,目前报道的还原方法包括物理和化学的方法,都存在各种各样的问题,比如危害环境,不兼容低温工艺等。本文提出了一种低温氧化石墨烯还原的方法。利用氢等离子体和氧化石墨烯反应,去除含氧官能团,实现还原氧化石墨烯。经过氢等离子体还原后,表征各个含氧官能团的吸收峰强度下降或者消失, Raman光谱上D峰强度的增加,都证实氧化石墨烯被还原。还原后薄膜电阻降低,确认了该方法的可行性。

Abstract

The reduction of graphene is an efficient method for macro graphene preparation. There are some problems,in the re-duction routes at present, including physical and chemical reduction , such as non-friendly environment and non-adaption to low temperature processes. Herein, we reduce the graphene oxide by hydrogen ions reacting with the oxygen group in graphene oxide. The results show that the absorption peak, indicating different oxygen group, and the resistance which proved that the graphene oxide was reduced during hydrogen plasma processing,are all decreased, and the G peak in Raman spectra is increased, So low temperature hydrogen plasma is determined to be a feasible method to reduce graphene oxide.

关键词

氧化石墨烯/等离子体/还原

Key words

graphene oxide/hydrogen plasma/reduction

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基金项目

科技部国际合作项目(2013DFR706200)

陕西省科技新星技术(2014KJXX0-710)

出版年

2015
真空
中国机械工业集团公司沈阳真空技术研究所

真空

CSTPCD
影响因子:0.926
ISSN:1002-0322
参考文献量12
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