四极静电聚焦透镜在离子束溅射镀膜中的应用
Application of electrostatic quadrupole lens on ion beam deposition
孙嵩泉 1葛怀庆 1王杨阳 1郭祖华 2练菊 2鞠若麟 3朱向炜2
作者信息
- 1. 普乐新能源(蚌埠)有限公司,安徽蚌埠233030
- 2. 蚌埠雷诺真空技术有限公司,安徽蚌埠233000
- 3. 南京理工大学 电子工程与光电技术学院,江苏南京210000
- 折叠
摘要
离子束溅射镀膜过程中,从离子源出射的离子束具有较强的发散性.对于靶源距较大的离子束溅射应用,发散的离子束不仅会溅射其他结构表面而造成微量元素交叉污染,而且镀膜均匀性也会有影响.通过在离子源前端加装一套四极静电聚焦透镜,对出射离子束的发散性进行约束,不仅避免了交叉污染,而且膜层的均匀性也从±5％(没使用静电聚焦透镜使用)改善到±3％(使用静电聚焦透镜).
Abstract
During the ion beam sputtering deposition,the divergence of incident ion beam will not only cause cross contamination due to the sputtering on other structural surfaces,but also affect the uniformity of the thin coating for the larger distance to target source in the application of ion beam sputtering.By installing a set of electrostatic quadrupole lens in front of the ion source,the divergence of ion beam is well confined.The cross contamination can be avoided and the uniformity of coating on the substrate is improved from ± 5％ (electrostatic lens off) to ±3％ (electrostatic lens on).
关键词
离子束/溅射/静电聚焦透镜/均匀性Key words
ion beam/sputtering/electrostatic quadrupole lens/uniformity引用本文复制引用
出版年
2016
NETL
NSTL
维普
万方数据