首页|不同温度下氮化铬薄膜的疏水性能研究

不同温度下氮化铬薄膜的疏水性能研究

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利用电弧离子镀膜技术,以硅片、不锈钢、玻璃片为基底,在脉冲偏压分别为50V、100V、150V的条件下制备了三组氮化铬薄膜样品,对其物相、表面形貌、力学性能及不同温度下的疏水性能进行了分析研究.结果表明:所制备薄膜样品组分单一,表面存在些许"大颗粒",当脉冲偏压为100 V时"大颗粒"数量最多;氮化铬薄膜力学性能优良,150 V脉冲偏压下沉积的薄膜具有较高的硬度和杨氏模量,50 V脉冲偏压样品具有较高的膜基结合力;常温(20℃)下薄膜疏水性均较好,基底材料对疏水性能影响不大;各组薄膜疏水性能随环境温度的增加而降低,当环境温度上升至80℃时脉冲偏压为50 V的薄膜丧失疏水性能,脉冲偏压为100 V的薄膜样品疏水性能整体较优.
Hydrophobic Properties of Chromium Nitride Thin Films at Different Temperatures
Arc ion plating was adopted to prepare three sets of chromium nitride(CrN)thin films with pulsed bias voltages of 50,100,and 150 V,respectively on silicon,stainless steel and glass substrates.The phase components,surface morphology,mechanical properties and hydrophobicity at different temperatures of the films were analyzed.The results show that the as-prepared samples present a pure component,and there are some macro-particles on the surface of the films.The films fabricated at 100 V show excellent mechanical properties despite there are a lot of macro-particles on the surface.The films fabricated at 150 V have high hardness and excellent Young modulus,while the films fabricated at 50 V have high adhesion strength,indicating that mechanical properties of the CrN thin films are excellent.The films exhibit good hydrophobicity at room temperature(20 ℃),and the substrate material has little effect on the hydrophobicity.The hydrophobicity of the films decreases with increasing environmental temperatures.The films deposited at 50 V lose hydrophobicity when the ambient temperature rises to 80 ℃,and the films deposited at 100 V have the optimized hydrophobicity.

CrN thin filmtemperaturehydrophobic performancemechanical property

赵祯赟、陈定君、郭圆萌、杨皓、东帅、孙铁生、黄美东

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天津师范大学物理与材料科学学院,天津 300387

重庆公共运输职业学院,重庆 402247

氮化铬薄膜 温度 疏水性能 力学性能

国家级大学生创新创业训练计划项目

202110065021

2024

真空
中国机械工业集团公司沈阳真空技术研究所

真空

CSTPCD
影响因子:0.926
ISSN:1002-0322
年,卷(期):2024.61(1)
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