真空2024,Vol.61Issue(1) :41-46.DOI:10.13385/j.cnki.vacuum.2024.01.06

脉冲激光沉积ZnSe∶Cox纳米晶薄膜的微结构及光学性质研究

Studies on the Microstructure and Optical Properties of Nanocrystalline ZnSe∶Cox Thin Film Prepared by Pulsed Laser Deposition

李树锋 王丽 高东文
真空2024,Vol.61Issue(1) :41-46.DOI:10.13385/j.cnki.vacuum.2024.01.06

脉冲激光沉积ZnSe∶Cox纳米晶薄膜的微结构及光学性质研究

Studies on the Microstructure and Optical Properties of Nanocrystalline ZnSe∶Cox Thin Film Prepared by Pulsed Laser Deposition

李树锋 1王丽 2高东文2
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作者信息

  • 1. 中国人民警察大学警务装备技术学院,河北 廊坊 065000
  • 2. 北京工业大学理学部物理与光电工程系,北京 100124
  • 折叠

摘要

采用脉冲激光沉积技术在基片温度为800℃条件下制备了不同Co含量的ZnSe∶Cox(x=0.1,0.3,0.5)微晶薄膜.通过X射线衍射、原子力显微镜、X射线光电子能谱、红外透射光谱及光致发光光谱分析了薄膜的微结构及光学特性.结果表明:所制备的纳米晶薄膜结晶质量优秀,具有(111)择优取向,薄膜结晶质量、光谱透射率和光学带隙均随Co含量的增加而减小;薄膜在波长约700~850 nm处存在一吸收带,这源于Co2+在周围Se2-构成的四面体晶场中4A2(4F)→4T1(4P)能级之间的跃迁;当Co掺入量x=0.5时,薄膜达到过掺杂状态,α-Co杂质相出现,薄膜红外光致发光谱大幅降低.

Abstract

ZnSe∶Cox(x=0.1,0.3,0.5)nanocrystalline thin films were deposited on sapphire substrates by pulsed laser deposition at substrate temperature of 800 ℃.The crystal structure and optical properties of the thin films were investigated by X-ray diffraction,atomic force microscope,X-ray photoelectron spectroscopy,optical transmittance and photoluminescence spectra.The results show that the thin films with excellent crystalline quality and(111)preferred orientation are prepared.With increasing Co concentration,the crystalline quality,average transmittance and band gap of films decrease.There is a absorption band at the wavelength of about 700-850 nm in the film,which comes from the transition between 4A2(4F)→4T1(4P)energy levels of Co2+in the tetrahedral crystal field composed of surrounding Se2-.The films reach an overdoping state when the x value increases to 0.5,and the photoluminescence intensity of films decrease substantially due to the α-Co impurities un-incorporating into ZnSe lattice.

关键词

脉冲激光沉积/硒化锌掺钴/薄膜/光学性质

Key words

pulsed laser deposition/ZnSe∶Co/thin film/optical property

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基金项目

廊坊市科技计划项目(2021011002)

出版年

2024
真空
中国机械工业集团公司沈阳真空技术研究所

真空

CSTPCD
影响因子:0.926
ISSN:1002-0322
参考文献量6
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