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卷绕蒸镀设备偏置线圈设计及参数分析

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在卷绕蒸镀设备生产过程中,电子束引起的较高能二次电子会影响复合集流体的质量.较高能二次电子的发射率与电子束的入射角在一定范围内成正比,因此利用额外磁场可以使电子束轨迹发生偏置,从而减小入射角.本文依靠仿真软件及CAD建模技术对电磁偏置线圈进行了开发设计,通过参数优化,得到匹配的磁场强度以及电子偏置轨迹,成功完成电子偏置线圈的设计.同时对电磁线圈参数对偏置的影响进行了对比分析.结果表明:增加电磁线圈的电流、匝数、尺寸、数量,以及减少线圈与电子枪的距离,都能减少电子束偏置半径.通过优化这些参数可以得到预定入射角度,实现低的二次电子发射率,为将来设备的迭代升级提供设计依据.
Design and Parameter Analysis of Bias Coil for Roll to Roll Evaporation Equipment
The high energy secondary electrons caused by electron beam will affect the quality of composite current collector during the roll to roll evaporation equipment working.The emissivity of secondary electron is proportional to the incident angle of the electron beam in a certain range,and the trajectory of electron beam can be biased in magnetic field.In this paper,one kind of electromagnetic bias coil was developed and designed based on simulation software and CAD modeling technology.Through parameter optimization,the matching magnetic field intensity and electron bias trajectory were obtained to reduce the incidence angle.At the same time,the influence of the electromagnetic coil parameters on bias were compared and analyzed.The results show that increasing the current,number of turns,coil size,coil number,and reducing the distance between the coil and the electron gun can all reduce the electron beam bias radius.By optimizing these parameters,the predetermined incidence angle can be obtained,and achieving low secondary electron emissivity,and providing a design basis for future equipment iteration upgrades.

roll to roll evaporationelectron beambias coilparameter optimization

尹翔、陈世斌、张艳鹏、刘旭、龙连春

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北京北方华创真空技术有限公司,北京 100015

北京工业大学,北京 100124

卷绕蒸镀 电子束 偏置线圈 参数优化

2024

真空
中国机械工业集团公司沈阳真空技术研究所

真空

CSTPCD
影响因子:0.926
ISSN:1002-0322
年,卷(期):2024.61(2)
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