真空2024,Vol.61Issue(3) :70-73.DOI:10.13385/j.cnki.vacuum.2024.03.12

无色聚酰亚胺薄膜二次表面镜的光学特性研究

Research on Optical Properties of CPI Film Second Surface Mirror

李灿伦 倪俊 郭腾 韩玮 王飞 祁松松 李辉 范孝鹏 范秋林
真空2024,Vol.61Issue(3) :70-73.DOI:10.13385/j.cnki.vacuum.2024.03.12

无色聚酰亚胺薄膜二次表面镜的光学特性研究

Research on Optical Properties of CPI Film Second Surface Mirror

李灿伦 1倪俊 1郭腾 1韩玮 1王飞 1祁松松 1李辉 1范孝鹏 1范秋林1
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作者信息

  • 1. 上海卫星装备研究所,上海 200240
  • 折叠

摘要

采用磁控溅射镀膜工艺,以无色透明聚酰亚胺(CPI)膜为基底,Ag和Al作为反射层,制备了CPI薄膜二次表面镜.使用Lambda 950 分光光度计对二次表面镜的反射曲线进行分析,研究了在红外波段和可见光波段,CPI薄膜二次表面镜与聚全氟乙丙烯(F46)薄膜镀银二次表面镜、聚酰亚胺(PI)薄膜镀铝二次表面镜反射性能的差异.结果表明:在可见光波段,CPI薄膜镀银二次表面镜与F46 镀银薄膜相当,反射率达95%以上;较传统PI镀铝薄膜,CPI镀铝薄膜反射率明显提升;在红外光波段,CPI薄膜反射性能不及F46 薄膜,与传统PI薄膜相当;CPI薄膜镀银二次表面镜吸收发射比(αs/ε)达 0.19,与F46薄膜镀银二次表面镜的相近,而耐温性能优于F46薄膜镀银二次表面镜.

Abstract

The secondary surface mirror of colorless transparent polyimide(CPI)film was prepared using magnetron sputtering coating process,with CPI film as substrate and Ag or Al as reflecting layer.The reflectance curve of secondary surface mirror film was analyzed by using Lambda 950 spectrophotometer.The reflectivity differences of secondary surface mirror of CPI film,silver plating on polyfluoroethylene propylene(F46)film and aluminum plating on polyimide thin film(PI)were studied in infrared and visible light bands.The results show that the secondary surface mirror of silver plating on CPI film is similar to that of F46 film in visible light band,up to 95%.Compared with the traditional PI aluminum coating,the reflectivity of CPI aluminum coating is obviously improved.In infrared light band,the reflectivity of CPI thin films is not as good as that of F46 thin films,which is comparable to that of traditional PI thin films.The absorption and emission ratio(αs/ε)of silver coating on CPI film is 0.19,which is close to that of the silver coating on F46 film,and the temperature resistance is better than that of F46 film.

关键词

热控薄膜/无色透明聚酰亚胺/二次表面镜/光学特性

Key words

thermal control coating/colorless transparent polyimide/second surface mirror/optical property

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出版年

2024
真空
中国机械工业集团公司沈阳真空技术研究所

真空

CSTPCD
影响因子:0.926
ISSN:1002-0322
参考文献量21
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