首页|基于系统回归模型的真空镀膜设备液冷加热盘设计方法研究

基于系统回归模型的真空镀膜设备液冷加热盘设计方法研究

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晶圆加热盘的设计有两大核心性能指标:工作面温度均匀性和控温能力,晶圆加热盘在设计定型前需要经过多次仿真迭代与测试验证,以确定产品性能满足设计需求.本研究基于有限元计算与系统回归模型,精准预测加热器实际所需长度、功率密度以及对应排布方案,以温度均匀性为优化目标,获取最优设计方案.经不同方案验证,该模型的精度在 98%以上,可显著提升加热盘设计效率,为人工智能在加热盘设计领域的应用提供可能性.此外,基于传热学理论,提出了一种加热盘控温能力的设计方法,通过一维计算的方式,为加热盘控温能力的优化设计起到了指导作用.
Research on Design Method of Liquid Cooled Heater for Vacuum Coating Equipment Based on System Regression Model
The design of wafer heating plate has two core performance indicators:uniformity of working surface temperature and temperature control ability,and the wafer heating plates needs to be verified by multiple simulation iterations and tests before the design is finalized to determine that the product performance meets the design requirements.Based on the finite element calculation and system regression model,this study accurately predicts the actual required length,power density and corresponding layout scheme of the heater,and proposes a method to obtain the optimal solution with temperature uniformity as the goal.The verification results of different schemes show that the accuracy of the model is above 98%,which can greatly improve the design efficiency of heating plate and provide the possibilities for the application of artificial intelligence in the field of heating plate design.In addition,based on the theory of heat transfer,a design method for heating plate temperature control ability is proposed,which guides the design of heating plate temperature control ability through one-dimensional calculation.

semiconductorvacuum coating equipmentwafer heaterwater coolingregression modelthermal control

李翔、姜小蛟、战春鸣、刘昂、孙宁、李加平

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沈阳富创精密设备股份有限公司,辽宁 沈阳 110015

沈阳真空技术研究所有限公司,辽宁 沈阳 110042

半导体 真空镀膜设备 晶圆加热盘 水冷 回归模型 控温能力

辽宁科技重点项目

2023JH1/11200010

2024

真空
中国机械工业集团公司沈阳真空技术研究所

真空

CSTPCD
影响因子:0.926
ISSN:1002-0322
年,卷(期):2024.61(4)
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