首页|CeN薄膜表面Cr和Ti抗氧化涂层的制备与性能研究

CeN薄膜表面Cr和Ti抗氧化涂层的制备与性能研究

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采用直流磁控溅射在单晶硅基底上制备了2μm厚的氮化铈(CeN)薄膜,并研究了CeN在大气环境中的氧化行为.鉴于CeN在大气环境中容易与氧气反应而劣化分解这一问题,在CeN上沉积了不同厚度的钛(Ti)或铬(Cr)抗氧化涂层以提高其抗氧化性能.实验结果表明,Ti/CeN复合薄膜在大气环境中暴露较短时间内就会起皮脱落;2.4 μm Cr/2 μm CeN复合薄膜可以有效地延长CeN在大气环境中的存放时间.最后,探讨了CeN与抗氧化层复合薄膜的氧化机理.
Preparation and Properties Research of Cr and Ti Oxidation Resistant Coatings on the Surface of CeN Thin Films
A 2 μm thick CeN film was prepared on a single-crystal silicon substrate using direct current magnetron sputtering,and the oxidation behavior of CeN in ambient air was investigated.Given the susceptibility of CeN to react with oxygen in the atmosphere,leading to degradation and decomposition,various thicknesses of Ti or Cr anti-oxidation coatings were deposited on CeN to enhance its oxidation resistance.The results revealed that Ti/CeN composite films were damaged and detached when exposed to ambient air for a short time.In contrast,a 2.4 μm Cr film covered on 2 μm CeN film can effectively extend the storage time of CeN in ambient air.Finally,the oxidation mechanism of the CeN and anti-oxidation layer composite films were discussed.

Magnetron sputteringCerium nitrideAntioxidant coating

罗凯、肖易、蒋琬玉、贾永峰、蒋玉苹、曹林洪、符亚军

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西南科技大学材料与化学学院 绵阳 621000

磁控溅射 氮化铈 抗氧化涂层

四川省自然科学基金项目中广核委托项目

23NSFTD0044

2024

真空科学与技术学报
中国真空学会

真空科学与技术学报

CSTPCD北大核心
影响因子:0.761
ISSN:1672-7126
年,卷(期):2024.44(6)