真空科学与技术学报2024,Vol.44Issue(7) :577-582.DOI:10.13922/j.cnki.cjvst.202312001

Mg85Ni15减反层对玻璃衬底上VO2薄膜光电性能的影响

Influence of Mg85Ni15 Anti-Reflection Layers on Photoelectric Properties of the VO2 Thin Films on Glass Substrate

王坤 王麒雯 刘初蕾 康朝阳
真空科学与技术学报2024,Vol.44Issue(7) :577-582.DOI:10.13922/j.cnki.cjvst.202312001

Mg85Ni15减反层对玻璃衬底上VO2薄膜光电性能的影响

Influence of Mg85Ni15 Anti-Reflection Layers on Photoelectric Properties of the VO2 Thin Films on Glass Substrate

王坤 1王麒雯 1刘初蕾 2康朝阳2
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作者信息

  • 1. 河南地矿职业学院 郑州 451464
  • 2. 河南大学未来技术学院 郑州 450046
  • 折叠

摘要

采用脉冲激光沉积技术,在非晶玻璃衬底上生长单斜晶相的二氧化钒(M-VO2)薄膜,并研究了Mg85Ni15 减反层对M-VO2 薄膜性能的影响.实验结果表明:在非晶玻璃衬底上制备的M-VO2 薄膜具有单一取向且纯度较高,并具有良好的光电热致转变性能.Mg85Ni15 作为减反层,在没有特别降低电学性能的基础上,提高了薄膜的可见光透过率和太阳能调节率.通过对减反层厚度的优化发现:在减反层厚度为 60 nm时,相变温度最低,且热滞宽度最窄为 6℃.此工作的开展有利于推进VO2 薄膜在智能窗方面的应用.

Abstract

A monoclinic phase of vanadium dioxide(M-VO2)film was grown on an amorphous glass substrate by pulsed laser deposition technique,and the effect of the Mg85Ni15 anti-reflection layers on the M-VO2 film was investigated.The experimental results show that the M-VO2 film prepared on the amorphous glass substrate has a single orientation and high purity.As an anti-reflection layer,Mg85Ni15 improves the visible light transmittance and solar energy adjustment rate of the film.By optimizing the thickness of the anti-reflection layer,it is found that when the thickness of the anti-reflection layer is 60 nm,the phase transition temperature is the lowest and the thermal hysteresis width is the narrowest at 6℃.The development of this work is conducive to promoting the application of VO2 thin films in smart windows.

关键词

脉冲激光沉积/VO2薄膜/Mg85Ni15减反层/光电性能

Key words

Pulsed laser deposition/VO2 thin films/Mg85Ni15 anti-reflection layer/Photoelectric properties

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基金项目

国家自然科学基金项目(11405045)

出版年

2024
真空科学与技术学报
中国真空学会

真空科学与技术学报

CSTPCD北大核心
影响因子:0.761
ISSN:1672-7126
参考文献量1
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