Influence of Mg85Ni15 Anti-Reflection Layers on Photoelectric Properties of the VO2 Thin Films on Glass Substrate
A monoclinic phase of vanadium dioxide(M-VO2)film was grown on an amorphous glass substrate by pulsed laser deposition technique,and the effect of the Mg85Ni15 anti-reflection layers on the M-VO2 film was investigated.The experimental results show that the M-VO2 film prepared on the amorphous glass substrate has a single orientation and high purity.As an anti-reflection layer,Mg85Ni15 improves the visible light transmittance and solar energy adjustment rate of the film.By optimizing the thickness of the anti-reflection layer,it is found that when the thickness of the anti-reflection layer is 60 nm,the phase transition temperature is the lowest and the thermal hysteresis width is the narrowest at 6℃.The development of this work is conducive to promoting the application of VO2 thin films in smart windows.
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