退火温度对Ta2O5薄膜光学和表面特性的影响
Effect of Annealing Temperature on Optical Properties and Surface Properties of Ta2O5 Thin Films
李坤 1何延春 1王兰喜 1周超 1贺颖 1王虎 1王艺 1熊玉卿1
作者信息
- 1. 兰州空间技术物理研究所 真空技术与物理重点实验室,兰州 730000
- 折叠
摘要
针对退火温度影响Ta2O5 薄膜的光学和表面特性的问题,采用电子束蒸发技术在石英基底上制备了该薄膜,并将薄膜样品分别在 200℃、400℃和 600℃下进行退火.利用光谱仪测试了薄膜的透射率并反演计算得到薄膜的折射率和消光系数的变化规律,采用X射线衍射仪和原子力显微镜表征了薄膜的表面性能.研究表明,薄膜透射率曲线的峰值随退火温度升高而显著提升.随着退火温度升高,薄膜的折射率和消光系数均逐渐变大,表面粗糙度呈现下降的趋势,表面变得致密.退火前后薄膜均为非晶态.该研究为进一步提高Ta2O5 薄膜的性能提供了试验数据.
Abstract
The effect of annealing temperature on the optical and surface properties of Ta2O5 films has been investigated.The thin films were prepared on quartz substrate by electron beam evaporation technique and annealed at 200℃,400℃and 600℃respectively.The transmissibility of the films was measured by spectrograph,and the variation of refractive index and extinction coefficient were obtained by inversion calculation.The surface properties of the films were characterized by X-ray diffraction and atomic force microscopy.The results show that the maximum value of the transmittance curve of the films in-crease significantly with the increase of annealing temperature.With the increase of annealing temperature,the refractive in-dex and extinction coefficient of Ta2O5 film increase gradually,while the surface roughness of the film decreases,and the sur-face of films becomes dense.Both deposited and annealed films are amorphous.This study provides experimental data for further improving the performance of Ta2O5 thin films.
关键词
Ta2O5薄膜/退火温度/光学/表面Key words
Ta2O5 thin films/annealing temperature/optical/surface引用本文复制引用
基金项目
重点实验室基金(HTKJ2021KL510003)
出版年
2024
NETL
NSTL
万方数据