液态靶材磁控溅射技术研究进展
Research Progress on Magnetron Sputtering with Liquid Target
王浪平 1孙田玮1
作者信息
摘要
随着先进制造业的迅猛发展,对高性能涂层的需求日益增长.以经济高效的方式沉积高性能涂层成为了科学界研究的热点.液态靶材磁控溅射技术因兼备磁控溅射与蒸镀的优点,受到了研究者的广泛关注.从液态靶材磁控溅射技术的基本原理出发,深入分析了放电过程中的特点与等离子体特性,总结了其特点与优势以及在涂层沉积领域的具体应用,最后指出了该技术当前存在的不足之处,并对其未来的发展趋势进行了展望.
Abstract
With the rapid development of advanced manufacturing technology,the demand for high-performance coat-ings has correspondingly increased.Deposition of high-performance coatings in an economic and efficient way has become a hot topic in scientific research.Due to the advantages of both magnetron sputtering and vapor deposition,the magnetron sput-tering technology of liquid target has been widely concerned by researchers.The underlying principles of liquid target mag-netron sputtering technology is deeply studied.The discharge characteristics and plasma properties of liquid target magnetron sputtering technology are deeply analyzed.The distinctive features and advantages of liquid target magnetron sputtering tech-nology are summarized,and the specific applications in the field of coating deposition is mainly introduced.The current limi-tations of this technology are also pointed out,and its future development trends is prospected.
关键词
磁控溅射/液态靶材/薄膜制备/等离子体特性/放电特性/蒸发/高沉积速率Key words
magnetron sputtering/liquid target/thin film preparation/plasma characterization/discharge characteriza-tion/evaporation/high deposition rate引用本文复制引用
基金项目
中国福建能源器件科学与技术创新实验室开放基金(21C-OP-202210)
出版年
2024
NETL
NSTL
万方数据