Research Progress on Magnetron Sputtering with Liquid Target
With the rapid development of advanced manufacturing technology,the demand for high-performance coat-ings has correspondingly increased.Deposition of high-performance coatings in an economic and efficient way has become a hot topic in scientific research.Due to the advantages of both magnetron sputtering and vapor deposition,the magnetron sput-tering technology of liquid target has been widely concerned by researchers.The underlying principles of liquid target mag-netron sputtering technology is deeply studied.The discharge characteristics and plasma properties of liquid target magnetron sputtering technology are deeply analyzed.The distinctive features and advantages of liquid target magnetron sputtering tech-nology are summarized,and the specific applications in the field of coating deposition is mainly introduced.The current limi-tations of this technology are also pointed out,and its future development trends is prospected.
magnetron sputteringliquid targetthin film preparationplasma characterizationdischarge characteriza-tionevaporationhigh deposition rate
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