首页|YSZ/STO纳米多层膜在忆阻器中的应用与氧空位诱导的载流子迁移率提升

YSZ/STO纳米多层膜在忆阻器中的应用与氧空位诱导的载流子迁移率提升

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氧空位主导的载流子迁移率对忆阻器性能的影响引起了广泛关注。当单层厚度低于临界值时,通过形成纳米多层异质结构可以显著提高器件的载流子迁移率。在本研究中,采用激光脉冲技术在NSTO底电极上沉积YSZ/STO纳米多层膜活性层,进而在其上制备Pt顶电极构筑了 Pt/[YSZ/STO]n/NSTO忆阻器。研究发现,采用五周期YSZ/STO薄膜作为活性层的Pt/[YSZ/STO]5/NSTO器件显示出优异的忆阻性能,其相应的载流子迁移率相比于其他周期数YSZ/STO纳米多层膜构筑的忆阻器有显著提高。实验结果和理论分析都表明这是由于器件中氧空位浓度的显著增加所致。本研究工作为今后改善基于氧空位传输型忆阻器的性能提供了重要参考。
Oxygen vacancy induced carrier mobility enhancement in nano-multilayered ZrO2∶Y2O3/SrTiO3 thin films for non-volatile memory devices
The influence of oxygen vacancy-dominated carrier mobility on the performance of memristors has attracted considerable attention.The device's carrier mobility can be significantly improved by forming a nano-multilayered heterostructure when the individual layer thickness is below a critical value.In this work,Pt/[ZrO2∶Y2O3(YSZ)/SrTiO3(STO)]n/Nb∶SrTiO3(NSTO)memristive devices were configurated through laser pulse deposited YSZ/STO nano-multilayered active layer with both Pt and NSTO acting as top and counter electrodes.Specifically,the Pt/[YSZ/STO]5/NSTO device with five consecutive layers of YSZ/STO thin film shows superior memristor performance,and its corresponding carrier mobility presents a significantly enhanced value compared to that of other periodic numbers of YSZ/STO composed memristive devices.This can be attributed to the increase of oxygen vacancy concentration in the device,as evidenced by both experimental results and theoretical analysis.This work provides a significant approach in improving the performance of memristor dominated by oxygen vacancy transporting mechanism.

YSZ/STO nano-multilayered thin filmmemristoroxygen vacancycarrier mobility

杨泽欧、黄小忠、胡海龙、马冰洋、尚海龙、岳建岭

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State Key Laboratory of Powder Metallurgy,Central South University,Changsha 410083,China

Research Institute of Aerospace Technology,Central South University,Changsha 410083,China

School of Mechanical Engineering,Shanghai Dianji University,Shanghai 200240,China

YSZ/STO纳米多层薄膜 忆阻器 氧空位 载流子迁移率

2024

中南大学学报(英文版)
中南大学

中南大学学报(英文版)

CSTPCDEI
影响因子:0.47
ISSN:2095-2899
年,卷(期):2024.31(10)