首页|Microstructure and AMR Properties of Permalloy Films Sputtered on (Ni_(0.81)Fe_(0.19))_(0.66)Cr_(0.34) Buffer
Microstructure and AMR Properties of Permalloy Films Sputtered on (Ni_(0.81)Fe_(0.19))_(0.66)Cr_(0.34) Buffer
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(Ni_(0.81)Fe_(0.19))_(0.66)Cr_(0.34) has a high resistivity and a crystal structure close to that of Ni_(0.81)Fe_(0.19). The electrical and X-ray diffraction measurements prove that a thin NiFeCr seed layer induces a well (111)-oriented Ni_(0.81)Fe_(0.19) film. Post-annealing treatment improves the magnetic properties of (Ni_(0.81)Fe_(0.19))_(0.66)Cr_(0.34) (45A)/Ni_(0.81)Fe_(0.19) (150A)/Ta(55A) thin film prepared under a deposition field, whereas the inter-diffusion of NiFe/Ta deteriorates the magnetoresistance properties of the film.
permalloy filmAMRbuffer layer
YANG Xiao-fei、PENG Zi-long、LIAO Hong-wei
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Huazhong University of Science and Technology
2004
Journal of Wuhan University of Technology: Materials science edition
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