首页|Characteristics of Synthesized Diamond Films by Using CACVD Techniques at High Temperatures

Characteristics of Synthesized Diamond Films by Using CACVD Techniques at High Temperatures

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This paper presents synthesized diamond films by using combustion activated chemical vapor deposition (CACVD) techniques. The characteristics of diamond films have been studied at wide ranges of temperature (30-400℃). The resistance of diamond films has been determined for hydrogen termination times of 5, 10, 15, and 20 minutes, and at the operation temperatures of 500, 600, and 700℃. The investigation found that, at 30℃ a synthesized diamond film has a high resistance (10~(10) Ω), whereas at high temperatures (100-400℃) the resistance has decreased from 4.04 MΩ to 2.42 MΩ. The result obtained from the hydrogen termination showed that the resistance has decreased by 10~5-10~6 Ω (at 30℃). Summarily, it can be stated that the higher the hydrogen termination times and operation temperatures, the lower the resistance of diamond films.

diamond filmCACVDhydrogen terminationhigh temperature

Y. Wongprasert、S. B. Pongsai

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Department of Electronics, Faculty of Engineering, King Mongkut's Institute of Technology Ladkrabang, Thailand

Department of Chemistry, Faculty of Science, Burapha University, Thailand

2010

Key engineering materials

Key engineering materials

ISSN:1013-9826
年,卷(期):2010.421/422
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