首页|Preparation of CaBi_4Ti_4O_(15) based thick films on Si substrates by screen printing

Preparation of CaBi_4Ti_4O_(15) based thick films on Si substrates by screen printing

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  • NETL
  • NSTL
  • Trans Tech Publications Ltd
CaBi_4Ti_4O_(15) based thick films were prepared by screen-printing method on Si substrates. Screen-printable pastes were prepared by kneading the CaBi_4Ti_4O_(15) powder in a three-roll mill with an organic vehicle. The remanent polarization of 6.3 μC/cm~2 and coercive field of 130kV/cm were obtained for the CaBi_4Ti_4O_(15) with Nb_2O_5 1wt% thick film fired at 1130℃. The cavity structure was prepared by etching of Si substrate. The displacement-electric field butterfly curves were obtained.

CaBi_4Ti_4O_(15)screen printingthick film

Tatsunori Kakuda、Tomoaki Futakuchi、Tsutomu Obata、Yuichi Sakai、Masatoshi Adachi

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Toyama Ind. Tech. Ctr., 150, Futagami-machi, Takaoka-shi, Toyama, 933-0981, JAPAN

Toyama Ind. Tech. Ctr., 383, Takada, Toyama-City. Toyama, 930-0866, JAPAN

Toyama Pref. Univ., 5180 Kurokawa, Imizu-shi, Toyama 939 - 0398, JAPAN

2010

10.4028/www.scientific.net/KEM.421-422.50

Key engineering materials

Key engineering materials

ISSN：1013-9826
年,卷(期)：2010.421/422
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