首页|Effects of UV Irradiation on Microstructure and Properties of HfO_2 Films Prepared from Alkoxy-derived Precursor Solution
Effects of UV Irradiation on Microstructure and Properties of HfO_2 Films Prepared from Alkoxy-derived Precursor Solution
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Trans Tech Publications Ltd
The HfO_2 films prepared from alkoxy-derived precursor solution chemically modified with diethanolamine. The effects of UV irradiation on the HfO_2 films were investigated. The UV irradiation using low pressure mercury lamp (LPML) was effective for the organics decomposition in the film and densification. The uniform and smooth HfO_2 films were obtained. The refractive index of HfO_2 films was enhanced.
HfO_2thin filmprecursor solutionUV irradiation
Kazuyuki Suzuki、Kazumi Kato
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National Institute of Advanced Industrial Science and Technology (AIST) 2266-98 Anagahora, Shimoshidami, Moriyama-ku, Nagoya 463-8560, Japan
NETL
NSTL
Trans Tech Publications Ltd
