首页|Zinc Self-diffusion in Isotopic Heterostructured Zinc Oxide Thin Films

Zinc Self-diffusion in Isotopic Heterostructured Zinc Oxide Thin Films

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  • Trans Tech Publications Ltd
Zinc isotopic heterostructured zinc oxide thin films of ~(64)ZnO/~(68)ZnO/~(64)ZnO were synthesized using pulsed laser deposition. The pulsed laser was first irradiated onto a polycrystalline target of ~(64)ZnO to deposit the ~(64)ZnO layer, then onto the ~(68)ZnO target to prepare the ~(68)ZnO layer and finally, the ~(64)ZnO target was used again. The ~(64)ZnO/~(68)ZnO/~(64)ZnO layered thin film was thus obtained. The thin films were annealed at various diffusion annealing temperatures. Diffusion profiles of the zinc isotopes due to the annealing were evaluated using secondary ion mass spectrometry (SIMS). The diffusion coefficients were slightly higher near the interface between the thin film and the substrate (the inner region) compared to the near surface (the outer region).

diffusionzincZnOthin filmSIMSisotopeheterostructure

Kenji MATSUMOTO、Yutaka ADACHI、Takeshi OHGAKI、Isao SAKAGUCHI、Tsubasa NAKAGAWA、Naoki OHASHI、Hajime HANEDA

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Kyushu University, 6-1 Kasuga-kouen Kasuga, Fukuoka, 816-8580 Japan National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044 Japan

National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044 Japan

2010

10.4028/www.scientific.net/KEM.421-422.193

Key engineering materials

Key engineering materials

ISSN：1013-9826
年,卷(期)：2010.421/422
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