首页|Fabrication of PbTiO_3 Nanocrystals on Atomically Flat Sapphire Substrates by Sputtering

Fabrication of PbTiO_3 Nanocrystals on Atomically Flat Sapphire Substrates by Sputtering

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In order to perform the growth position control, PbTiO_3 (x=0) (PTO) nanocrystals were deposited on atomically flat and non-atomically flat α-Al_2O_3 substrates by RF magnetron sputtering. The atomically flat substrates with atomic steps and terrace are expected to induce the lateral growth along a terrace between the surface steps. In the case of the atomically flat, the nanocrystals got lined up along the atomic steps, and uniform nanocrystals were obtained on surface in same pitch.

PbTiO_3lead titanatePZTthin filmnanocrystalsputteratomically flat sapphire

Takashi Nishida、Koichi Kubo、Masahiro Echizen、Hiroaki Takeda、Kiyoshi Uchiyama、Tadashi Shiosaki

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Graduate School of Materials Science, Nara Institute of Science and Technology, 8916-5 Takayama, Ikoma, Nara 630-0101, Japan

Graduate School of Science and Engineering, Tokyo Institute of Technology, 2-12-1, Ookayama, Meguro, Tokyo, 152-8550, Japan

2010

Key engineering materials

Key engineering materials

ISSN:1013-9826
年,卷(期):2010.421/422
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