首页|Effect of Input Power on the Deposition of Optical Grade Thick Diamond Film in a DCPJ CVD Jet System

Effect of Input Power on the Deposition of Optical Grade Thick Diamond Film in a DCPJ CVD Jet System

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  • Trans Tech Publications Ltd
High quality optical grade thick diamond film wafers with different thickness are prepared by high power DC arc plasma jet CVD (DCPJ CVD) method using a CH_4/Ar/H_2 gas mixture. Three different powers, 13.65,15.40 and 17.94kW, were employed during the investigation. The aim was to investigate the effect of these powers on the deposition of thick diamond film. The controlled system was discussed together. The results show that the average diamond grain size and growth rate increase with input plasma power, but a further increase in input power, diamond thick-film defects and amorphous carbon content increased.

input powerthick diamond filmCVDthick diamond film

R.F. Chen、Z.X. Shen、L.G. Dai、X.L. Zhang、R. Zhu、D.W. Zuo

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Department of Mechanical Engineering, Yangzhou University, Yangzhou, 225009, China

Department of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, Nanjing, 210016, China

2010

10.4028/www.scientific.net/KEM.426-427.245

Key engineering materials

Key engineering materials

ISSN：1013-9826
年,卷(期)：2010.426/427
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