首页|The Deep Etching Process Based on Parallel Laser Direct Writing System
The Deep Etching Process Based on Parallel Laser Direct Writing System
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NETL
NSTL
Trans Tech Publications Ltd
Due to the high cost-effectiveness, extra flexibility, and short production cycle, laser direct writing system as a kind of maskless lithography technology has been widely used in the fields of micro-nano-manufacturing. The working principle of the parallel laser direct writing system based on DMD(Digital Micromirror Device) is introduced. A novel negative photoresist - dry film photoresist is adopted into the study of deep etching for the fabrication of the micro mold. The experimental results show that: the whole process is convenient, efficient and flexible; the precision of the 2-D patterning and the depth of etching is reliable.
parallel laser direct writingmaskless lithographydeep lithographydry film photoresist
J.Hu、D.L.Pu、L.S.Chen
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Institute of Information Optical Engineering, Soochew University, Suzhou, Jiangsu, 215006, China
SVG Optronics Co., Ltd, Suzhou Industrial Park, Jiangsu, 215026, China
NETL
NSTL
Trans Tech Publications Ltd
