首页|ZnO films growth at different temperature on the substrate of Corning glass by MOCVD

ZnO films growth at different temperature on the substrate of Corning glass by MOCVD

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  • NETL
  • NSTL
  • Trans Tech Publications Ltd
We deposited ZnO films on Corning glass substrate by metal-organic chemical vapor deposition (MOCVD). We found the diffraction (002) peak at ～34.46°, indicating that the ZnO thin films were C-oriented. ZnO films were highly transparent with a transmission ratio larger than 85% in the visible range. The surface morphology of the films was observed by atomic force microscopy (AFM).

ZnOthin filmsgrowthglassMOCVD

W. Tang、X. Yang、C. Wang、C. Zhao、X. Gao、J. Yang、B. Liu、H. Liang、J. Zhao、J. Sun、G. Du

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Jilin Institute of Architecture and Civil Engineering, Hongqi Street 1129#, Changchun City, Jilin Province, China

Jilin Institute of Architecture and Civil Engineering, Hongqi Street 1129#, Changchun City, Jilin Province, China Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences Dongnanhu Street 16#, Changchun City, Jilin Province China

Northwestern University, USA

Dalian University of Technology, China

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2010

10.4028/www.scientific.net/KEM.428-429.447

Key engineering materials

Key engineering materials

ISSN：1013-9826
年,卷(期)：2010.428/429
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