首页|Growth of ZnO films under different oxygen partial pressures by metal organic chemical vapour deposition

Growth of ZnO films under different oxygen partial pressures by metal organic chemical vapour deposition

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  • NETL
  • NSTL
  • Trans Tech Publications Ltd
ZnO films were grown under different oxygen partial pressures by metal organic chemical vapor deposition on the substrates of Corning glass. We investigated the quality of the films by SIEMENS D8 X-ray diffractometer. The surface morphology of the films were observed by Digital Nanoscope IIIa AFM with normal silicon nitride tip in the contact mode. The hall effect measurements were carried out with indium ohmic contact. The transmission spectrum of the films were measured. The transmission ratio is larger than 80% in the region above the wavelength of 385nm, and sharply decreased under 10% below the wavelength of 375 nm.

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C. Wang、X. Yang、B. Liu、C. Zhao、W. Tang、J. Yang、X. Gao、H. Liang、J. Zhao、J. Sun、G. Du

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Jilin Institute of Architecture and Civil Engineering, Hongqi Street 1129#, Changchun City, Jilin Province, China

Jilin Institute of Architecture and Civil Engineering, Hongqi Street 1129#, Changchun City, Jilin Province, China Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences Dongnanhu Street 16#, Changchun City, Jilin Province China

Northwestern University, USA

Dalian University of Technology, China

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2010

10.4028/www.scientific.net/KEM.428-429.458

Key engineering materials

Key engineering materials

ISSN：1013-9826
年,卷(期)：2010.428/429
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