首页|Effect of Anisotropy on Chemical Mechanical Polishing of LBO Crystal

Effect of Anisotropy on Chemical Mechanical Polishing of LBO Crystal

扫码查看
原文链接
  • NETL
  • NSTL
  • Trans Tech Publications Ltd
The anisotropy of LBO crystal leads to the different properties of different crystal faces, such as thermal expansion coefficient, which results in trouble of ultra-precision machining. Chemical mechanical polishing of a face (001), b face (010) and c face (001) of LBO crystal by adopting Logitech PM5 Precision Lapping & Polishing Machine in the same process conditions was investigated. The effect of anisotropy on MRR and surface roughness was studied. In the same CMP process conditions, c face of LBO crystal is the highest MRR, b face is inferior to and a face is the lowest. And surface roughness of c face is the best, b face is followed and a face is the worst. The results also show that the anisotropy leads to the different MRR and surface roughness on different crystal faces. In CMP of LBO crystal, the higher MRR is, and the better surface roughness is in the scope of experiment.

anisotropyLBO crystalchemical mechanical polishing (CMP)material removal rate (MRR)surface roughness

Jun Li、Yongwei Zhu、Dunwen Zuo、Yong Zhu、Chuangtian Chen

展开 >

College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, No. 29 Yudao Street, Nanjing, China, 210016 Beijing Center for Crystal R & D, Technical Institute of Physics and Chemistry of Chinese Academy of Sciences, Beijing, China, 100080

College of Mechanical and Electrical Engineering, Nanjing University of Aeronautics and Astronautics, No. 29 Yudao Street, Nanjing, China, 210016

Beijing Center for Crystal R & D, Technical Institute of Physics and Chemistry of Chinese Academy of Sciences, Beijing, China, 100080

2010

10.4028/www.scientific.net/KEM.431-432.33

Key engineering materials

Key engineering materials

ISSN：1013-9826
年,卷(期)：2010.431/432
  • 1
  • 14