首页|Fabrication and Characterization of NiCr/NiSi Functional Thin Films on Temperature Measurement of Cutter Sensor

Fabrication and Characterization of NiCr/NiSi Functional Thin Films on Temperature Measurement of Cutter Sensor

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NiCr/NiSi functional thin films of temperature measurement of cutter sensor were prepared by means of advanced Twinned microwave ECR plasma source enhanced Radio Frequency (RF) reaction non-balance magnetron sputtering technique. Fabrication technologies of NiCr/NiSi thin films were studied. The Compositions, micro-morphology, general structure and depth of NiCr/NiSi thin films were analyzed by means of Electron Probe, SEM, AFM, step profiler and stereo vision micro operation system. The results showed that NiCr/NiSi thin-films were small depth, uniform compact, smooth and good continuity, composition of which was close to target.

cuttermeasurement temperature sensorNiCr/NiSifunctional thin film

Yunxian Cui、Deshun Yang、Qiyong Zeng、Baoyuan Sun

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Key Laboratory for Precision and Non-traditional Machining Technology of Ministry of Education, Dalian University of Technology, Dalian Liaoning, China,116024 School of Mechanical Engineering of Dalian Jiaotong University, Dalian, China, 116028

School of Mechanical Engineering of Dalian Jiaotong University, Dalian, China, 116028

College of Quality & Safety Engineering, China Jiliang University, Hangzhou, China, 310018

2010

Key engineering materials

Key engineering materials

ISSN:1013-9826
年,卷(期):2010.431/432
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