首页|Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure

Motif Parameters Based Characterization of Line Edge Roughness of a Nanoscale Grating Structure

扫码查看
原文链接
  • NETL
  • NSTL
  • Trans Tech Publications Ltd
Motif parameters were introduced to characterize line edge roughness (LER) of a nanoscale grating structure. Firstly with electron beam lithography employed the expected nanoscale grating structure with linewidth of 16 nm was fabricated on positive resist. Then the line edge profiles of the structure were extracted and their LERs were characterized. The results showed that the evaluation method is rather simple, effective and recommendable.

motif parametersnanoroughnessline edge roughnessnanostructure

Zhuangde Jiang、Fengxia Zhao、Weixuan Jing、Philip D. Prewett、Kyle Jiang

展开 >

State Key Laboratory for Manufacturing Systems Engineering at Xi'an Jiaotong University No. 28 Xianning West Road, Xi'an, 710049, P. R. China School of Mechanical Engineering, University of Birmingham Edgbaston, Birmingham, B15 2TT, UK

State Key Laboratory for Manufacturing Systems Engineering at Xi'an Jiaotong University No. 28 Xianning West Road, Xi'an, 710049, P. R. China

School of Mechanical Engineering, University of Birmingham Edgbaston, Birmingham, B15 2TT, UK

2010

10.4028/www.scientific.net/KEM.437.45

Key engineering materials

Key engineering materials

ISSN：1013-9826
年,卷(期)：2010.437
  • 9