首页|Deformation mode construction using photoresist microstructure devices produced with nanoindention technology

Deformation mode construction using photoresist microstructure devices produced with nanoindention technology

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  • NETL
  • NSTL
  • Trans Tech Publications Ltd
In this study, we try to produce SU-8 photoresist microstructure devices using nano-imprint technology, and try to conduct nano-indention tests on SU-8 photoresist with nano-indention detector, in order to describe the behaviors and characteristics of nano-indentions on SU-8 microstructure devices and establish the deformation mode for the indention under nano-meter level. The tests tell us that, after nano-indention tests, the result indention hardness increases with the loading rate, indention repeats, and reduction of load or depth. Similarly, the indention hardness decreases because of reduction of loading rate, extension of loading time, and increase of load, and depth. Finally, we propose a deformation mode for nano-indention. This mode can also be used to explain the deformation behavior of SU-8 under nano-indention.

deformation modenano-indentionSU-8 photoresistmechanical propertiesnanoimprint technology

Yung-Jin Weng、Yung-Chun Weng、Hsu-Kang Liu、Lin-Hsiung Chiu

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Center for General Education, Kainan University, Taoyuan, 338, Taiwan

Department of Mechanical Engineering, National Taiwan University, Taipei, 106, Taiwan

Automobile Department, Nan-Chiang Vocational High School, Sindiani, 231, Taiwan

2010

10.4028/www.scientific.net/KEM.447-448.539

Key engineering materials

Key engineering materials

ISSN：1013-9826
年,卷(期)：2010.447/448
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