首页|Nickel Injection Mould Fabrication via Proton Beam Writing and UV Lithography

Nickel Injection Mould Fabrication via Proton Beam Writing and UV Lithography

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For applications of injection mould fabrication in the field of MEMS, proton beam writing (PBW) and UV lithography are combined to manufacture 2 mm thick Ni moulds with sub-10 μm fine features in 10 μm deep fluidic channels. PBW is capable of writing micro and nano features with straight and smooth sidewalls with sub-10 nm RMS roughness, while UV lithography has the advantage of large area structuring through a mask. A newly developed positive resist maP1275 hv is presented in combination with PBW and UV lithography for Ni injection mould fabrication. Fine micro pillars with straight and smooth sidewalls have been achieved by PBW and linked with UV lithography into a micro fluidic channel. The new resist is successfully removed after electroplating without compromising the Ni mould.

proton beam writingNi mouldinjection mouldingUV lithographyfluidics

Liu Nan Nan、Shao Peige、Shripad R. Kulkami、Zhao Jianhong、Jeroen A van Kan

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Engineering Science Programme, National University of Singapore

Centre for Ion Beam Applications, Department of Physics, National University of Singapore, 19260 Singapore, Singapore

Singapore Institute of Manufacturing Technology, 638075 Singapore, Singapore

2010

Key engineering materials

Key engineering materials

ISSN:1013-9826
年,卷(期):2010.447/448
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