首页|Comparison of the bias voltage effect and the force effect during the nanoscale AFM electric lithography on the copper thin film surface

Comparison of the bias voltage effect and the force effect during the nanoscale AFM electric lithography on the copper thin film surface

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AFM electric nanolithographytip‐based nanofabricationnanofabrication of the metallic thin filmnanoscale scratchingnanoscale thermal effect

Yang Ye、Lin Jun

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Shanghai Normal University The College of Information Mechanical and Electrical Engineering Shanghai China

2016

Scanning: The journal of scanning microscopy

Scanning: The journal of scanning microscopy

SCI
ISSN:0161-0457
年,卷(期):2016.38(5)
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