Abstract
By a News Reporter-Staff News Editor at Robotics & Machine Learning DailyNews Daily News – According to news reporting originating from Washington, D.C., by NewsRx journalists,a patent application by the inventors FORSTNER, Tobias (SteiBlingen, DE); QUARTI, Ulrich (Konstanz,DE); REBSTOCK, Lutz (Gaienhofen, DE), filed on November 17, 2021, was made available online onJanuary 4, 2024.No assignee for this patent application has been made.Reporters obtained the following quote from the background information supplied by the inventors: ““Field“The present disclosure relates to a method and a system for inspection of an inner pod or an outerpod of an EUV pod.“Brief Description of Related Developments“Lithography for semi-conductor manufacturing is constantly changing to shorter wavelengths in orderto be able to achieve smaller features. At present, wavelengths in the extreme UV, so called EUV, arebeing implemented more and more. The development of special EUV masks (reticles) for EUV lithographyis by now well researched and developed.
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