首页|Patent Issued for Substrate inspection system and a method of use thereof (USPTO 11840762)
Patent Issued for Substrate inspection system and a method of use thereof (USPTO 11840762)
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News editors obtained the following quote from the background information supplied by the inventors:“Technical Field“The present disclosure relates to a glass and wafer inspection system, and more particularly the presentdisclosure relates to a camera-based inspection system and a method for inspecting film deposition processfor glass and wafers.“Description of Related Technology“Glasses and wafers referred to hereinafter as a substrate, are coated with a variety of coatings toenhance their mechanical, chemical, optical, electric, magnetic, or other properties. Typically, one ormore thin films are deposited on the substrate by one of several known processes, such as chemical vapordeposition (CVD) which is a common process for depositing thin films on substrates.”
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