首页|Patent Issued for Substrate inspection system and method of use thereof (USPTO 11901202)
Patent Issued for Substrate inspection system and method of use thereof (USPTO 11901202)
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
Jnk Tech (San Jose, California, United States) has been issued patent number 11901202, according to news reporting originating out of Alexandria, Virginia, by NewsRx editors. The patent's inventors are Choi, Youngjin (San Jose, CA, US). This patent was filed on October 20, 2022 and was published online on February 13, 2024. From the background information supplied by the inventors, news correspondents obtained the following quote: "Technical Field "The disclosed technologies generally relate to a glass and wafer inspection system, and more particularly the disclosed technologies relate to a camera-based inspection system and a method for inspecting a film deposition process for glass and wafers. "Description of Related Technology "Glasses and wafers (hereinafter to be interchangeably used with a substrate) are coated with a variety of coatings to enhance their mechanical, chemical, optical, electric, magnetic, or other properties. Typically, one or more thin films are deposited on the substrate by one of several processes, such as chemical vapor deposition (CVD) which is a common process for depositing thin films on substrates."
NETL
NSTL
