首页|Patent Issued for Method and system for 3D modeling based on irregular-shaped sk etch (USPTO 11915370)
Patent Issued for Method and system for 3D modeling based on irregular-shaped sk etch (USPTO 11915370)
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
The patent’s assignee for patent number 11915370 is Recon Labs Inc. (Seoul, Sout h Korea). News editors obtained the following quote from the background information suppli ed by the inventors: “Freehand sketch is an effective and efficient way of visua lizing various design ideas in the early stages of design to simulate shapes, pr oduction methods, functions, and the like. To this end, designers conduct design simulations by using various sketch programs.
NETL
NSTL
