首页|Researchers Submit Patent Application, 'Substrate Inspection System And A Method Of Use Thereof', for Approval (USPTO 20240102169)
Researchers Submit Patent Application, 'Substrate Inspection System And A Method Of Use Thereof', for Approval (USPTO 20240102169)
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News editors obtained the following quote from the background information suppli ed by the inventors:““Technical Field“The present disclosure relates to a glass and wafer inspection system, and more particularly the presentdisclosure relates to a camera-based inspection system and a method for inspecting film deposition processfor glass and wafers.“Description of Related Technology“Glasses and wafers referred to hereinafter as a substrate, are coated with a va riety of coatings toenhance their mechanical, chemical, optical, electric, magn etic, or other properties. Typically, one ormore thin films are deposited on th e substrate by one of several known processes, such as chemical vapordeposition (CVD) which is a common process for depositing thin films on substrates.”
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