首页|'Substrate Treating Apparatus' in Patent Application Approval Process (USPTO 202 40105482)
'Substrate Treating Apparatus' in Patent Application Approval Process (USPTO 202 40105482)
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The following quote was obtained by the news editors from the background informa tion supplied by theinventors: “Examples of currently-used substrate treating a pparatus include a substrate treating apparatusof a hybrid type provided with a batch-type processing module (batch processing unit) configured to performtrea tment on a plurality of substrates collectively, and a single-wafer-type process ing module (single-waferprocessing unit) configured to perform treatment on the substrates treated by the batch-type processingmodule one by one. See, for exa mple, Japanese Patent Publication (Translation of PCT Application) No.2016-5022 75 and Japanese Unexamined Patent Publication No. 2021-064652.
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