首页|Fast Edge Machine Learning for Adversarial Robust Distillation
Fast Edge Machine Learning for Adversarial Robust Distillation
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By a News Reporter-Staff News Editor at Robotics & Machine Learning DailyNews Daily News – According to news reporting based on a preprint abstract, our journalists obtained thefollowing quote sourced from os f.io:“Edge machine learning (Edge ML) offers solutions for deploying ML models direct ly on resourceconstrainededge devices.“However, ensuring adversarial robustness remains a challenge.
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