首页|Patent Application Titled 'Substrate Treating Apparatus' Published Online (USPTO 20240142171)
Patent Application Titled 'Substrate Treating Apparatus' Published Online (USPTO 20240142171)
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Reporters obtained the following quote from the background information supplied by the inventors: “ “The present disclosure relates to a substrate treating apparatus. “In order to manufacture a semiconductor device, various processes such as depos ition, photography, etching, and cleaning are performed. Among them, the photogr aphic process includes a coating process, an exposure process, and a developing process. The coating process involves coating a photosensitive liquid such as a photoresist on a substrate. The exposure process involves exposing a circuit pat tern on the substrate by exposing light from a light source through a photomask on the coated photoresist film. Finally, the developing process includes selecti vely developing an exposed area of the substrate.
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