Abstract
News editors obtained the following quote from the background information suppli ed by the inventors: “Chambers are used in many types of processing systems. Exa mples of chambers include etch chambers, deposition chambers, anneal chambers, a nd the like. Typically, a substrate, such as a semiconductor wafer, is placed on a substrate support within the chamber and conditions in the chamber are set an d maintained to process the substrate. After processing, substrates may be inspe cted for defects. Multiple defects may form a pattern on a substrate, indicative of one or more deficiencies of the processing equipment.”
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