Abstract
The following quote was obtained by the news editors from the background informa tion supplied by the inventors: “Ions are used in a plurality of semiconductor p rocesses, such as implantation, amorphization, deposition and etching processes. These semiconductor processes are typically performed in a process chamber, whi ch is maintained at near vacuum conditions. “Before a semiconductor workpiece can be processed, it is transported from an am bient environment to the process chamber. Further, after being transported to th e process chamber, the semiconductor workpiece is typically aligned in a specifi c orientation.
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