首页|Patent Application Titled 'Transfer Robot For Reduced FootprintPlatform Archite cture' Published Online (USPTO 20240194505)
Patent Application Titled 'Transfer Robot For Reduced FootprintPlatform Archite cture' Published Online (USPTO 20240194505)
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NETL
NSTL
Reporters obtained the following quote from the background information supplied by the inventors: “The background description provided here is for the purpose o f generally presenting the context of the disclosure. Work of the presently name d inventors, to the extent it is described in this background section, as well a s aspects of the description that may not otherwise qualify as prior art at the time of filing, are neither expressly nor impliedly admitted as prior art agains t the present disclosure. “A substrate processing system may be used to perform deposition, etching and/or other treatment of substrates such as semiconductor wafers. During processing, a substrate is arranged on a substrate support in a processing chamber of the su bstrate processing system. Gas mixtures including one or more precursors are int roduced into the processing chamber and plasma may be struck to activate chemica l reactions.
NETL
NSTL
