首页|Patent Issued for Glass and wafer inspection system and a method of use thereof (USPTO 11987884)
Patent Issued for Glass and wafer inspection system and a method of use thereof (USPTO 11987884)
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
By a News Reporter-Staff News Editor at Robotics & Machine Learning Daily News Daily News – A patent by the inventors Choi, Youngj in (San Jose, CA, US), filed on June 11, 2021, was published online on May 21, 2 024, according to news reporting originating from Alexandria, Virginia, by NewsR x correspondents. Patent number 11987884 is assigned to Jnk Tech (San Jose, California, United Sta tes). The following quote was obtained by the news editors from the background informa tion supplied by the inventors: “Glasses and wafers referred to hereinafter as a substrate, are coated with a variety of coatings to enhance their mechanical, c hemical, optical, electric, magnetic, or other properties. Typically, one or mor e thin films are deposited on the substrate by one of several known processes, s uch as chemical vapor deposition (CVD) is a common process for depositing thin f ilms on substrates. The deposition process is conducted in special chambers, suc h as PECVD or PVD chambers. Robots are used to handle the glass in and out of th e chambers without any human intervention. The deposition process is generally m onitored for any defects, such as chipping, break, spot/stain etc. can be detect ed with known vision systems. However, the known inspection methods have several limitations. The deposition process is prone to several kinds of defects which cannot be detected by known inspection systems. Moreover, the known inspection s ystems cannot recognize the substrate location in the process chamber and a lot of other process parameters.
NETL
NSTL
