首页|Patent Issued for Substrate lift mechanism and reactor including same (USPTO 120 40217)
Patent Issued for Substrate lift mechanism and reactor including same (USPTO 120 40217)
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
The following quote was obtained by the news editors from the background informa tion supplied bythe inventors:“Gas-phase reactors for processing substrates, such as semiconductor wafers, oft en include a susceptorwithin a reaction chamber. During processing, one or more substrates are placed within the reactionchamber and onto the susceptor using a robotic arm. After processing, the substrate(s) are removed fromthe surface o f the susceptor and through an opening in the reaction chamber using the robotic arm.
ASM IP Holding B.V.Acute-Phase Protein sBeta-GlobulinsBlood ProteinsBusinessCarrier ProteinsEmerging Technolo giesIron-Binding ProteinsMachine LearningProteinsRoboticsRobotsTrans ferrin
NETL
NSTL
