Abstract
The following quote was obtained by the news editors from the background informa tion supplied bythe inventors:“Gas-phase reactors for processing substrates, such as semiconductor wafers, oft en include a susceptorwithin a reaction chamber. During processing, one or more substrates are placed within the reactionchamber and onto the susceptor using a robotic arm. After processing, the substrate(s) are removed fromthe surface o f the susceptor and through an opening in the reaction chamber using the robotic arm.
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