Robotics & Machine Learning Daily News2024,Issue(Jul.29) :106-110.

'Base Station Of Cleaning Device And Cleaning System' in Patent Application Appr oval Process (USPTO 20240225404)

Robotics & Machine Learning Daily News2024,Issue(Jul.29) :106-110.

'Base Station Of Cleaning Device And Cleaning System' in Patent Application Appr oval Process (USPTO 20240225404)

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Abstract

This patent application has not been assigned to a company or institution.The following quote was obtained by the news editors from the background informa tion supplied by theinventors: “With the progress of science and technology, pe ople have higher and higher requirements forquality of life, and have gradually increased demand for indoor cleaning. With respect to user demands forfloor sw eeping and floor mopping, more and more products realize both floor sweeping and floor moppingon one device, resulting in more convenient indoor cleaning with less manual intervention.

Key words

Emerging Technologies/Machine Learning/Patent Application/Robot/Robotics

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出版年

2024
Robotics & Machine Learning Daily News

Robotics & Machine Learning Daily News

ISSN:
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