首页|Patent Issued for Substrate transfer robot for transferring substrate in vacuum chamber (USPTO 12080586)
Patent Issued for Substrate transfer robot for transferring substrate in vacuum chamber (USPTO 12080586)
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NETL
NSTL
News editors obtained the following quote from the background information suppli ed by the inventors: “In general, a substrate such as a wafer for a semiconductor device, a glass sub strate for a display device, or a glass substrate for a thin film solar cell is manufactured by performing various processes on the substrate. During these proc esses, the substrate is loaded and processed in a substrate processing equipment that provides optimal conditions for each of the processes. “Nowadays, in order to improve productivity, a cluster-type substrate processing equipment capable of collectively processing the substrate is being developed a nd used.
NETL
NSTL
