首页|Researchers Submit Patent Application, 'Novel arc management algorithm of RF gen erator and match box for CCP plasma chambers', for Approval (USPTO 20240304429)
Researchers Submit Patent Application, 'Novel arc management algorithm of RF gen erator and match box for CCP plasma chambers', for Approval (USPTO 20240304429)
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
News editors obtained the following quote from the background information suppli ed by the inventors: “An arc generated in a load where a power is consumed may c ause damage to a power supply or the load. Although it is preferred to substanti ally prevent the generation of the arc, the arc may occur due to various factors . Therefore, technical efforts have been continued to detect the generation of a rc. In particular, for a plasma process where a RF power is used, the generated arc may damage a plasma chamber and contaminate the materials to be processed. I n this regard, technologies have been suggested to detect the arc generated in t he chamber and to rapidly block it.
NETL
NSTL
