Abstract
News editors obtained the following quote from the background information suppli ed by the inventors: “An arc generated in a load where a power is consumed may c ause damage to a power supply or the load. Although it is preferred to substanti ally prevent the generation of the arc, the arc may occur due to various factors . Therefore, technical efforts have been continued to detect the generation of a rc. In particular, for a plasma process where a RF power is used, the generated arc may damage a plasma chamber and contaminate the materials to be processed. I n this regard, technologies have been suggested to detect the arc generated in t he chamber and to rapidly block it.
NETL
NSTL