首页|Patent Application Titled 'Wafer Storage Container Drying Apparatus And Cleaning System' Published Online (USPTO 20240302099)
Patent Application Titled 'Wafer Storage Container Drying Apparatus And Cleaning System' Published Online (USPTO 20240302099)
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
Reporters obtained the following quote from the background information supplied by the inventors: “In the related art, there is a cleaning system for cleaning a nd drying wafer storage containers such as front opening unified pods (FOUP) or front opening shipping boxes (FOSB) that accommodate semiconductor wafers.
NETL
NSTL
