首页|Findings from Zhejiang University Provide New Insights into Plasma Etching (Opti mizing Plasma Etching: Integrating Precise Three- Dimensional Etching Simulation and Machine Learning for Multi- Objective Optimization)
Findings from Zhejiang University Provide New Insights into Plasma Etching (Opti mizing Plasma Etching: Integrating Precise Three- Dimensional Etching Simulation and Machine Learning for Multi- Objective Optimization)
扫码查看
点击上方二维码区域，可以放大扫码查看
原文链接
NETL
NSTL
By a News Reporter-Staff News Editor at Robotics & Machine Learning Daily News – Fresh data on plasma etching are presented in a n ew report. According to news reporting from Hangzhou, People’s Republic of China , by NewsRx journalists, research stated, “In modern semiconductor manufacturing , optimizing plasma etching processes is key for advancing technology and achiev ing profitable production.” Financial supporters for this research include National Key Research And Develop ment Program of China; Zhejiang Key Research And Development Project.
Zhejiang UniversityHangzhouPeople’s Republic of ChinaAsiaCyborgsEmerging TechnologiesMachine LearningNanot echnologyPlasma Etching
NETL
NSTL
