Abstract
Reporters obtained the following quote from the background information supplied by the inventors: “The statements in this section merely provide background info rmation related to the present disclosure and may not constitute prior art. “A thermal system for an industrial process typically includes a heater system And a process control system to monitor and control the operations of the heater system. The process control system may be a proportional-integral-derivative (PID) type configured to control a process variable of the heater system such as a temperature to a setpoint. The process variable is not only influenced by variou s factors within the thermal system, but also by external factors within the ind ustrial process, yet outside the control of the thermal system. These external factors could be, for example, a type of wafer being heated, gases being injected into a process chamber, and/or a pressure differential within a chamber for sec uring a wafer to a pedestal heater, among other factors that are uncontrollable by the thermal system. While sensors and/or algorithmic calculations may be used to monitor some factors influencing the process variable, obtaining accurate and reliable data, especially for data indicative of the external factors, may be difficult for certain industrial processes.”
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