首页|Patent Issued for Motion control apparatus, lithography apparatus, planarization apparatus, processing apparatus, and article manufacturing method (USPTO 121471 64)
Patent Issued for Motion control apparatus, lithography apparatus, planarization apparatus, processing apparatus, and article manufacturing method (USPTO 121471 64)
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News editors obtained the following quote from the background information suppli ed by the inventors:“Field of the Invention“The present invention relates to a motion control apparatus, a lithography appa ratus, a planarizationapparatus, a processing apparatus, and an article manufac turing method.“Description of the Related Art“For a control apparatus that controls a physical amount of a control target, a classic controller suchas a proportional-integral-derivative (PID) controller h as been widely used. In recent years, in addition tocontrol systems based on cl assic control theory and modern control theory, a control system constructedusi ng machine learning such as reinforcement learning may be used. A control system that uses both acontrol system including no machine learning and a control sys tem using machine learning may be used.According to Japanese Patent Laid-Open N o. 2019-71405, by using a feedback control apparatus thatuses both a control sy stem including no machine learning and a control system using machine learning, acontrol deviation of a control target object that cannot be compensated for co mpletely only by the controlsystem including no machine learning is reduced by the control system using machine learning.
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