摘要
新闻编辑从发明人提供的背景信息中获得了以下引文：“发明领域”本发明涉及一种运动控制装置、一种光刻装置、一种平面化装置设备、加工设备和物品制造方法。“相关技术描述”“对于控制目标的物理量的控制装置，典型的控制器，如(PID)控制器作为比例积分微分控制器h得到了广泛的应用。近年来，除了在经典控制理论和现代控制理论的基础上，构造了一个控制系统可以使用机器学习，例如强化学习。一种控制系统，它同时使用可以使用不包括机器学习的控制系统和使用机器学习的控制系统。根据日本专利公开No.2019-71405，通过使用反馈控制装置，使用不包括机器学习的控制系统和使用机器学习的控制系统，不能完全由控制补偿的控制对象的控制偏差使用机器学习的控制系统减少了不包含机器学习的系统。
Abstract
News editors obtained the following quote from the background information suppli ed by the inventors:“Field of the Invention“The present invention relates to a motion control apparatus, a lithography appa ratus, a planarizationapparatus, a processing apparatus, and an article manufac turing method.“Description of the Related Art“For a control apparatus that controls a physical amount of a control target, a classic controller suchas a proportional-integral-derivative (PID) controller h as been widely used. In recent years, in addition tocontrol systems based on cl assic control theory and modern control theory, a control system constructedusi ng machine learning such as reinforcement learning may be used. A control system that uses both acontrol system including no machine learning and a control sys tem using machine learning may be used.According to Japanese Patent Laid-Open N o. 2019-71405, by using a feedback control apparatus thatuses both a control sy stem including no machine learning and a control system using machine learning, acontrol deviation of a control target object that cannot be compensated for co mpletely only by the controlsystem including no machine learning is reduced by the control system using machine learning.
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