首页|Patent Issued for Substrate transfer robot for transferring substrate in vacuum chamber (USPTO 12131939)
Patent Issued for Substrate transfer robot for transferring substrate in vacuum chamber (USPTO 12131939)
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NETL
NSTL
The following quote was obtained by the news editors from the background informa tion supplied bythe inventors:“In general, a substrate such as a wafer for a semiconductor device, a glass sub strate for a displaydevice, or a glass substrate for a thin film solar cell is manufactured by performing various processes onthe substrate. During these proc esses, the substrate is loaded and processed in a substrate processingequipment that provides optimal conditions for each of the processes.
NETL
NSTL
